SIMAGIS Semi

For OPC validation, the newest SIMAGIS Semi is now the easiest way to get 2D contours because no design data is required. The latest release of SIMAGIS Semi enables 2D contours to be extracted from single CD-SEM images and exported automatically in GDSII format without the need for a design clip/data. Just drag/import the image and press Start. The contour is generated, at the desired threshold level, and saved automatically. No design clip is required. So now there is no need for the time consuming tasks of launching a separate application, loading a design file, creating a clip, saving it, exporting, re-importing and aligning it.

SIMAGIS Semi enables the image taken of double-patterning lithography to be analyzed and the data easily decomposed, separating the data for each of the two patterns so that the measurements for each pattern can be quantified separately as well as combined for total process window kinds of analysis. Data analysis is enabled by easy export to Excel, as well as an integrated Web Service and Microsoft Access database storage. The on-line database makes sharing images and accessing measurement data between workgroup members easy and efficient.

SIMAGIS Semi is built for everyday off-line analysis of top-down and cross-section CD-SEM images across the entire range/fleet of CD-SEMs. SIMAGIS is engineered for standard applications, and it can also be quickly and easily customized.

SIMAGIS Semi’s Advanced LER and LWR capabilities support advanced technology nodes, including optical, EUV and Imprint applications. With SIMAGIS Semi, critical image analysis is completed fast, and the data is easily transferred to information management systems. SIMAGIS Semi is used for process development, process control, defect analysis and failure analysis, across many technology job functions, including engineers, technicians and operators. It is used in Etch, Lithography, Metrology, and Failure Analysis departments among others. SIMAGIS is useful for anyone who needs to analyze images from different SEM tools and access measurements off-line by several different members of a workgroup.

The SIMAGIS Semi includes several applications, each with its own powerful algorithm/s, delivering comprehensive sets of automated measurements, from individual CD-SEM images and from large batches of images. New analysis approaches can be easily created and customized for example for emerging technologies, special processes and customized reporting.

SIMAGIS Semi Capabilities/Modules:

• 2D CD-SEM contours
• Contact/Via Array Analysis
• Line/Space analysis, including LER and LWR
• Cross-Section/Trench Analysis
• Wafer Defect Analysis

SIMAGIS Semi Key Advantages:

• 2D contours, no design data/clips needed!
• Built-in, standard applications
• Production interface
• Web service, measurement database
• Easily customized

Technical Paper

For additional insight into current metrology issues and SIMAGIS Semi’s capabilities, please request the following paper, which was presented at NIST: Automated Metrology for SEM Calibration and CD Line Measurements Using Image Analysis and SEM Modeling Methods

Request document: